A project is redesigning multi-junction thin-film silicon products to facilitate change from lab- to pilot-scale manufacturing. Innovative processes for light management and brand new absorber materials are boosting module efficiencies and reducing manufacturing expenses. Multi-junction solar-cell devices allow for higher transformation efficiencies contrasted to the conventional ones. However, such efficiencies are gained at the cost of increased complexity, with substrate geometries and layer interacting with each other greatly impacting the product overall performance. Experts are re-designing multi-junction thin-film silicon devices to facilitate change from lab- to pilot-scale manufacturing. Revolutionary procedures for light management and new absorber materials are boosting module efficiencies and reducing manufacturing expenses. Experts are concentrating on improving the fill factor and open-circuit voltage to boost the final power conversion performance of the thin-film silicon modules. The target is to demonstrate prototypes with 12 % efficiencies at costs below EUR 0.5 per Watt-peak. Novel textured substrates are increasing light-trapping in thin movies. The texturisation is achieved with nano-structures obtained by certain layer deposition methods such as chemical etching and nanoimprinting on cup. Experts have actually developed equipment for wet-chemical etching of transparent conductive oxide layers made of double-structured zinc oxide. Work on nanoimprinting on large-area modules is progressing as prepared. Doped and absorber layers are examined, examined and integrated for validation in products. Novel absorber materials consist of nanocrystalline silicon oxide levels for the top cell and surface-passivated nanocrystalline silicon layers for the bottom cellular. Especially, the development on textured substrates needs to be explored to determine its impact on the structural and electronic properties of the levels. By evaluating optical and electrical designs, the designs for module development will be selected. Work on high-rate deposition of nanocrystalline silicon bottom cells is ongoing. The first standardised round-robin tests have actually been performed at various organizations and institutes. an expense evaluation features been performed for nano-imprint lithography.